Repetitively pulsed HF chemical laser with high average power

Henri Brunet; Michel Mabru; C. Vannier

doi:10.1117/12.144647

4 May 1993 Repetitively pulsed HF chemical laser with high average power

Henri Brunet, Michel Mabru, C. Vannier

Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144647
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece

Abstract

A compact, repetitively pulsed HF chemical laser, built with a gas recirculator loop to cool and process the gas mixture, is described. A simple corona phototriggered discharge operating in SF₆/C₂H₆/Ne gas mixture is used to produce vibrationally excited HF molecules at typical pressures of 90 - 150 Torr. This laser produced over 5 J per pulse in single shot operation and a maximum average power of 500 W at a repetition rate of 110 Hz. The electrical efficiency is 3%.

Citation Download Citation

Henri Brunet, Michel Mabru, and C. Vannier "Repetitively pulsed HF chemical laser with high average power", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144647

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