0.25-um x-ray mask repair with focused ion beams

Diane K. Stewart; Thomas K. Olson; Billy Ward

doi:10.1117/12.146497

24 June 1993 0.25-um x-ray mask repair with focused ion beams

Diane K. Stewart, Thomas K. Olson, Billy Ward

Proceedings Volume 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III; (1993) https://doi.org/10.1117/12.146497
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A focused ion beam system has been developed to repair 0.25 micrometers proximity print X-ray masks. The system is distinguished from a 0.5 micrometers mask repair tool with the addition of a Micrion designed column, differential laser interferometry, thermal management, and gold deposition hardware. These subsystems contribute to the overall tool performance so that the defects can be located, imaged and repaired to industry specifications. We discuss the functionality of the repair tool and present results from inspection and repair of actual masks.

Citation Download Citation

Diane K. Stewart, Thomas K. Olson, and Billy Ward "0.25-um x-ray mask repair with focused ion beams", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); https://doi.org/10.1117/12.146497

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