Thermal Runaway In Laser-Heated Mirrors With Temperature-Dependent Absorptance

M. Sparks; R. Warren; E. Loh Jr.

doi:10.1117/12.958025

24 January 1980 Thermal Runaway In Laser-Heated Mirrors With Temperature-Dependent Absorptance

M. Sparks, R. Warren, E. Loh Jr.

Proceedings Volume 0198, Laser Applications in Materials Processing; (1980) https://doi.org/10.1117/12.958025
Event: 23rd Annual Technical Symposium, 1979, San Diego, United States

Abstract

A review of reflectors with temperature-dependent absorptance shows that above a critical irradiance, exponential thermal runaway occurs, while below it, the temperature rise approaches either a steady-state value or a slowly increasing value. Calculated damage thresholds, which are generally reduced substantially when the temperature dependence of the absorptance is included, fail to agree with experimental values in most cases because isolated-spot damage or plasma formation occurs. However, excellent agreement is obtained for special ion-cleaned or diamond-turned samples, which damage uniformly for long (~100 ns) pulses.

Citation Download Citation

M. Sparks, R. Warren, and E. Loh Jr. "Thermal Runaway In Laser-Heated Mirrors With Temperature-Dependent Absorptance", Proc. SPIE 0198, Laser Applications in Materials Processing, (24 January 1980); https://doi.org/10.1117/12.958025

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