Paper
15 February 1994 New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS
Russell A. Budd, John L. Staples, Derek B. Dove
Author Affiliations +
Abstract
The aerial image measurement system is an optical system for measurements on phase shift masks under chosen stepper characteristics of NA, sigma, wavelength and depth of focus. The present tool operates at I-line or DUV (248 nm) and commonly 5 or 6 inch reticles can be handled. The image obtained is optically equivalent to that incident on resist, but is highly magnified so that it can be recorded using an UV CCD camera. Typically, features of interest are recorded as a through focus series; image intensity is digitized and may be analyzed in a variety of ways so as to produce intensity contours or profiles. Combined with simple models for predicting resist behavior a great deal of information may be obtained on the expected printing performance of a given reticle as a function of intensity and depth of focus prior to actual resist tests.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Russell A. Budd, John L. Staples, and Derek B. Dove "New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167259
Lens.org Logo
CITATIONS
Cited by 26 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reticles

Photomasks

Objectives

Phase shifts

Imaging systems

Cameras

CCD cameras

RELATED CONTENT

A Pioneering Step And Repeat Camera
Proceedings of SPIE (March 01 1974)
Laser repair of phase-shifting masks
Proceedings of SPIE (February 15 1994)
High-resolution UV wavelength reticle inspection
Proceedings of SPIE (September 01 1998)

Back to Top