Analysis of mask distortion induced by heating during e-beam writing

Alberto Moel; Yoshio Gomei

doi:10.1117/12.191931

3 November 1994 Analysis of mask distortion induced by heating during e-beam writing

Alberto Moel, Yoshio Gomei

Author Affiliations +

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191931
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

The 3D heat diffusion equation was numerically solved to determine the e-beam writing induced local and global heating and the corresponding distortion for optical and x-ray masks. The beam was 50 kV with maximum current I equals 4 (mu) A for optical masks, and I equals 0.3 (mu) A for x-ray masks. Calculations indicate that the distortion due to the localized temperature rise is negligible for both types of masks. The global distortion for optical masks is on the order of 0.04 micrometers (for I equals 4 (mu) A), and on the order of 0.007 micrometers for x-ray masks (for I equals 0.3 (mu) A) for a dose of 10 (mu) C/cm² under dense-pattern mask writing conditions.

Citation Download Citation

Alberto Moel and Yoshio Gomei "Analysis of mask distortion induced by heating during e-beam writing", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191931

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