Paper
7 December 1994 Mask industry quality assessment
Al Strott, Larry Bassist
Author Affiliations +
Abstract
Product quality and timely delivery are two of the most important parameters in determining the success of a mask manufacturing facility. Because of the sensitivity of this data, very little was known about industry performance in these areas until an assessment was authored and presented at the 1993 BACUS Symposium by Larry Regis of Intel Corporation, Neil Paulsen of Intel Corporation, and James A. Reynolds of Reynolds Consulting. This data has been updated and will be published and presented at this year's BACUS Symposium. Contributor identities will again remain protected by utilizing Arthur Andersen & Company to compile the submittals. Participation was consistent with last year's representation of over 75% of the total merchant and captive mask volume in the United States. The data compiled includes shipments, customer return rate, customer return reasons from 1988 through Q2, 1994, performance to schedule, plate survival yield, and throughput time (TPT).
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Al Strott and Larry Bassist "Mask industry quality assessment", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195811
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Manufacturing

Photomask technology

Cadmium

Data conversion

Optical proximity correction

Compact discs

Photomasks

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