Silica with high resistance to excimer laser

Akira Fujinoki

doi:10.1117/12.213752

14 July 1995 Silica with high resistance to excimer laser

Akira Fujinoki

Proceedings Volume 2428, Laser-Induced Damage in Optical Materials: 1994; (1995) https://doi.org/10.1117/12.213752
Event: Laser-Induced Damage in Optical Materials: 1994, 1994, Boulder, CO, United States

Abstract

Optical property changes of newly developed silica by both KrF and ArF excimer laser irradiation will be reported. X-2-01 has been provided for high power laser application for several years and has proved its high performance against KrF laser irradiation. The new material X-1-04 shows superior optical stability in transmittance and refractive index change by KrF and ArF laser irradiation. The application of these materials will be discussed considering their properties of geometry, homogeneity, and laser resistance.

Citation Download Citation

Akira Fujinoki "Silica with high resistance to excimer laser", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213752

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