Fabrication processes for SCALPEL mask blanks

Harold A. Huggins; Kevin J. Bolan; James Alexander Liddle; Milton L. Peabody Jr.; Regine G. Tarascon-Auriol; David L. Windt

doi:10.1117/12.228176

8 December 1995 Fabrication processes for SCALPEL mask blanks

Harold A. Huggins, Kevin J. Bolan, James Alexander Liddle, Milton L. Peabody Jr., Regine G. Tarascon-Auriol, David L. Windt

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Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228176
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

SCALPEL^TM, (scanning with angular limitation projection electron-beam lithography) is a projection electron-beam lithography technique with the potential for high resolution and throughput that can extend the state of lithography below 0.18 micrometer. The success of this technology, developed at AT&T , is directly connected to the ability to manufacture a robust SCALPEL mask blank. An error budget analysis has been performed on the SCALPEL mask. This analysis has generated specific requirements for the mask blank. In this paper we discuss their impact on the mask blank fabrication and show that we are making good progress towards meeting these requirements.

Citation Download Citation

Harold A. Huggins, Kevin J. Bolan, James Alexander Liddle, Milton L. Peabody Jr., Regine G. Tarascon-Auriol, and David L. Windt "Fabrication processes for SCALPEL mask blanks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228176

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