Paper
8 December 1995 Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session
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Abstract
We report here survey and discussion results on mask accuracy and mask size at the 1995 PMJ (Photomask Japan) Rump Session. The questionnaires consist of mask size, lithography error budget, and mask error budget for 64M DRAM, 256M DRAM, and 1G DRAM. The number of replies was 52, 26 in advance and 26 on site. Seven panelists presented short papers on mask accuracy from the technical fields of device, lithography, mask making, and mask- related equipment. The discussion results of panelists also are shown.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshihiro Todokoro and Hiroaki Morimoto "Next-generation mask strategy: accuracy and mask-size survey and discussion results at PMJ '95 rump session", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228173
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KEYWORDS
Photomasks

Lithography

Etching

Mask making

Photoresist processing

Error analysis

Optical lithography

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