D-SCAN: an instrument for nondestructive monitoring of growth defects in GaAs wafers

Kestutis Jarasiunas; Juozas V. Vaitkus; E. Gaubas; J. Kapturauskas; R. Vasiliauskas

doi:10.1117/12.226222

3 November 1995 D-SCAN: an instrument for nondestructive monitoring of growth defects in GaAs wafers

Kestutis Jarasiunas, Juozas V. Vaitkus, E. Gaubas, J. Kapturauskas, R. Vasiliauskas

Proceedings Volume 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics; (1995) https://doi.org/10.1117/12.226222
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1995, Kiev, Ukraine

Abstract

An instrument for nondestructive and contactless determination of growth-defect planar distribution across LEC grown GaAs wafers has been developed and assembled. It can be used for monitoring the defectiveness of the wafers as for evaluation of the effect of technological processes (as doping, annealing, irradiation, etc.) on homogeneity of wafer characteristics. The possibilities of the instrument and transient grating technique for metrology of semiconductor parameters are shown.

Citation Download Citation

Kestutis Jarasiunas, Juozas V. Vaitkus, E. Gaubas, J. Kapturauskas, and R. Vasiliauskas "D-SCAN: an instrument for nondestructive monitoring of growth defects in GaAs wafers", Proc. SPIE 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, (3 November 1995); https://doi.org/10.1117/12.226222

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