Data-driven method for calculating limits for particle control charts

Diane Michelson

doi:10.1117/12.250911

13 September 1996 Data-driven method for calculating limits for particle control charts

Diane Michelson

Proceedings Volume 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II; (1996) https://doi.org/10.1117/12.250911
Event: Microelectronic Manufacturing 1996, 1996, Austin, TX, United States

Abstract

In semiconductor manufacturing, a key measure of product quality is the number of particles added during a fab processing step. Usual statistical process control methods assume an underlying normal distribution for the data. Particle measurements typically display skewed, nonnormal distributions, hence traditional control limits are not valid. This paper examines using bootstrap estimates of the upper percentiles of a distribution to find control limits for particle charts.

Citation Download Citation

Diane Michelson "Data-driven method for calculating limits for particle control charts", Proc. SPIE 2876, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, (13 September 1996); https://doi.org/10.1117/12.250911

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