Paper
30 December 1981 Design And Fabrication Of A High-Damage Threshold Infrared Smartt Interferometer
R. B. Hammond, A. J. Gibbs
Author Affiliations +
Proceedings Volume 0288, Los Alamos Conf on Optics '81; (1981) https://doi.org/10.1117/12.932078
Event: Los Alamos Conference on Optics, 1981, Los Alamos, United States
Abstract
It has been shown that a Smartt interferometer may be used as a very precise alignment tool for infrared lasers.(1) This interferometer may also be used effectively to investi-gate the phase front of a laser pulse. To use this tool for applications to high-power, short-pulse laser systems such as Helios and Antares, however, it has been necessary to fabricate a structure with the unique optical characteristics of the Smartt interferometer com-bined with a very high optical-damage threshold. We have been successful in this effort by utilizing the high technology, process control, and unique properties of semiconductor-grade, single-crystal Si.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. B. Hammond and A. J. Gibbs "Design And Fabrication Of A High-Damage Threshold Infrared Smartt Interferometer", Proc. SPIE 0288, Los Alamos Conf on Optics '81, (30 December 1981); https://doi.org/10.1117/12.932078
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KEYWORDS
Silicon

Interferometers

Absorption

Doping

Infrared radiation

Semiconducting wafers

Electrons

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