Influence of substrate cleaning on LIDT of 355 nm HR coatings

Jean DiJon; Pierre Garrec; Norbert Kaiser; Uwe B. Schallenberg

doi:10.1117/12.274290

13 May 1997 Influence of substrate cleaning on LIDT of 355 nm HR coatings

Jean DiJon, Pierre Garrec, Norbert Kaiser, Uwe B. Schallenberg

Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274290
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

An advanced high-purity reactive e-beam evaporation process was used to deposit Al₂O₃/SiO₂ HR coatings for 355 nm high-power laser applications. Both 1:1 and R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal and non-normal incident design were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm². Post-cleaning of coated substrates degrades LIDT.

Citation Download Citation

Jean DiJon, Pierre Garrec, Norbert Kaiser, and Uwe B. Schallenberg "Influence of substrate cleaning on LIDT of 355 nm HR coatings", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274290

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