CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 3051 > Article
Paper
7 July 1997 Photoresist materials: a historical perspective
C. Grant Willson, Ralph R. Dammel, Arnost Reiser
Author Affiliations +
Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275984
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800's to today's efforts to develop 193 nm resist materials.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
C. Grant Willson, Ralph R. Dammel, and Arnost Reiser "Photoresist materials: a historical perspective", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275984
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 14 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Lens.org Logo
CITATIONS
Cited by 7 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photoresist developing
Photoresist materials
Photography
RELATED CONTENT
Contrast enhancement materials for thick photoresist applications
Proceedings of SPIE (May 14 2004)
Photoresist materials: a historical perspective
Proceedings of SPIE (July 07 1997)
Holographic Embossing at Polaroid: The Polaform Process
Proceedings of SPIE (June 30 1986)
Photoresist materials: a historical perspective
Proceedings of SPIE (July 07 1997)
Resulting profile of holographically recorded structures in photoresists
Proceedings of SPIE (December 06 1993)
New Pattern Transfer Technology For G-line Lithography
Proceedings of SPIE (January 30 1989)
A Review Of Contrast In Positive Photoresists
Proceedings of SPIE (April 18 1985)
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top