Application of substructuring method to three-dimensional optical lithography simulation

Seung-Gol Lee; Choong-Ki Seo; Dong-Hoon Lee; Jong-Ung Lee; MeangHyo S. Cho

doi:10.1117/12.310812

29 June 1998 Application of substructuring method to three-dimensional optical lithography simulation

Seung-Gol Lee, Choong-Ki Seo, Dong-Hoon Lee, Jong-Ung Lee, MeangHyo S. Cho

Author Affiliations +

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310812
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The three-dimensional optical lithography simulator on the basis of finite element method is newly introduced. Contrary to the conventional direct finite element method, the problem of huge memory requirement can be resolved by applying the substructuring method to finite element method. In our scheme, the global domain, which consists of photoresist, interlayers, and the substrate, is divided into several subdomains. After each subdomain is treated locally, the calculation results are integrated altogether. Since the consuming memory is tremendously reduced by the substructuring method, the three- dimensional case can be successfully simulated at the engineering workstation. We have compared our scheme with the conventional direct finite element, and investigated the reduction of computational memory by the substructuring method.

Citation Download Citation

Seung-Gol Lee, Choong-Ki Seo, Dong-Hoon Lee, Jong-Ung Lee, and MeangHyo S. Cho "Application of substructuring method to three-dimensional optical lithography simulation", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310812

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