Laser pattern-generation technology below 0.25 um

Paul C. Allen

doi:10.1117/12.310774

29 June 1998 Laser pattern-generation technology below 0.25 μm

Paul C. Allen

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310774
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The projected rapid reduction in mask minimum feature size from the 250 nm to the 100 nm wafer generation will drive laser pattern generators to deep UV wavelengths. Commercially available sources exist in the 250 nm wavelength region using nonlinear optical materials to frequency double longer wavelength laser lines. Nonlinear optical materials, such as SBBO and KBBF, exist for wavelengths below 200 nm but they have not been commercialized. Second harmonic generation in intracavity or mode-locked, external resonant-ring laser configurations can be used to produce sub-200 nm radiation. Existing system architectures are shown to be easily modified to use pulsed sources with a high repetition rate. Advances in nonlinear optical materials, laser design, and system architecture will ensure that laser pattern generation will be an effective maskmaking technology for the next decade.

Citation Download Citation

Paul C. Allen "Laser pattern-generation technology below 0.25 μm", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310774

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available