Spectral Exposure Meter

Nathan Gold

doi:10.1117/12.933557

13 September 1982 Spectral Exposure Meter

Nathan Gold

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933557
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

As microlithography progresses to smaller geometries, the tolerance available for exposure variation is rapidly diminishing. Due to this requirement, it is advantageous to set the exposure more accurately by using an exposure meter that has its spectral response matched to the photoresist spectral response. A new exposure meter has been developed that contains a complete UV spectrometer in a package the size of a 100mm wafer chuck. This meter can be adjusted to match the response of any photoresist over the wavelength range of 254 to 436 nanometers.

Citation Download Citation

Nathan Gold "Spectral Exposure Meter", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933557

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