Fabrication of holographic binary-phase Fresnel lens arrays using inorganic photoresists

Peter F. Romanenko; Alexander V. Stronski; Ivan Z. Indutnyi

doi:10.1117/12.302475

10 March 1998 Fabrication of holographic binary-phase Fresnel lens arrays using inorganic photoresists

Peter F. Romanenko, Alexander V. Stronski, Ivan Z. Indutnyi

Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998) https://doi.org/10.1117/12.302475
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation

Abstract

The simple two-step method of binary phase microlens holographic recording, using As₄₀Se₆₀ inorganic resist (thermally evaporated As₄₀Se₆₀ layers) is presented. First step is fabrication of a master binary zone plate. During the recording of the holographic lens arrays this master lens was illuminated by the collimated argon laser irradiation and the interference pattern resulting from the interference of zeroth- and first-orders of diffraction was recorded in the As₄₀Se₆₀ layer. The contribution of the higher orders of diffraction was--two orders smaller. During the postexposure treatment the formed image was transferred into the glass substrate. The 8 X 12 planar holographic lens array was formed in glass plate. Each lens unit in array has 3.5 mm diameter, with focal length 37.5 mm and number of zones approximately 200. The zone profiles of each lens unit is rectangular, and diffraction efficiency is approximately 33%.

Citation Download Citation

Peter F. Romanenko, Alexander V. Stronski, and Ivan Z. Indutnyi "Fabrication of holographic binary-phase Fresnel lens arrays using inorganic photoresists", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); https://doi.org/10.1117/12.302475

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