Mask fabrication in the USA

Franklin D. Kalk

doi:10.1117/12.328850

1 September 1998 Mask fabrication in the USA

Franklin D. Kalk

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328850
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

Profound changes are occurring in the US mask industry. Two factors contribute to these changes. First, due to the prohibitive cost of developing new mask technology, captive mask shops have been largely displaced by merchant suppliers. Second, the mask technology ramp has exceeded the SIA roadmap. As a result, merchant suppliers must build advanced masks and ship them cost-effectively and on time from multiple manufacturing sites to many customers. This paper discusses the US mask industry and its technology position in the worldwide mask infrastructure. Examples of recent US technology thrusts are presented.

Citation Download Citation

Franklin D. Kalk "Mask fabrication in the USA", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328850

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