Screening of DNQ/novolac resists with e-beam exposure

Theodore H. Fedynyshyn; Scott P. Doran; Michele L. Lind; Theodore M. Lyszczarz; William F. DiNatale; Donna Lennon; Charles A. Sauer; Jeff Meute

doi:10.1117/12.350180

11 June 1999 Screening of DNQ/novolac resists with e-beam exposure

Theodore H. Fedynyshyn, Scott P. Doran, Michele L. Lind, Theodore M. Lyszczarz, William F. DiNatale, Donna Lennon, Charles A. Sauer, Jeff Meute

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350180
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have surveyed the commercial resist market with the dual purpose of identifying diazoquinone/novolac based resist that have potential for use as e-beam mask making resists and baselining these resist for comparison against future mask making resist candidates. For completeness, such a survey would require that each resists be compared with an optimized developer and develop process. To accomplish this task in an acceptable time period we have chosen to perform e-beam lithography modeling to quickly identify the resist developer combinations that will lead to superior resists performance. We describe the development and verification of a method to quickly screen commercial i-line resists under e-beam exposure with different developers. This was accomplished by determining modeling parameters for i-line resist from e-beam exposures, modeling the resist performance, and comparing predicted performance versus actual performance. We evaluated whether the technique of combining e-beam resist modeling with lithography can be used to quickly and efficiently screen i-line resists for use in e-beam mask making. This was accomplished by comparing experimentally determined resists sensitivities and profiles with those predicted from ProBeam/3D lithography modeling software.

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Theodore H. Fedynyshyn, Scott P. Doran, Michele L. Lind, Theodore M. Lyszczarz, William F. DiNatale, Donna Lennon, Charles A. Sauer, and Jeff Meute "Screening of DNQ/novolac resists with e-beam exposure", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350180

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