Review of x-ray collimators for x-ray proximity lithography

Stephen M. Lane; Troy W. Barbee Jr.; Stanley Mrowka; Juan R. Maldonado

doi:10.1117/12.371115

23 November 1999 Review of x-ray collimators for x-ray proximity lithography

Stephen M. Lane, Troy W. Barbee Jr., Stanley Mrowka, Juan R. Maldonado

Proceedings Volume 3767, EUV, X-Ray, and Neutron Optics and Sources; (1999) https://doi.org/10.1117/12.371115
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

Simple arguments are given that elucidate the need for x-ray collimator optics in point source proximity lithography. Seven recent collimator optics deigns are briefly described. Three of these designs are described in greater detail: a flat mirror array developed by Xmetrics, Inc.; a polycapillary array developed by X-Ray Optical Systems, Inc.; and a scanning paraboloidal collimator developed by Lawrence Livermore National Laboratory. For the latter two collimators test results using the JMAR Technologies, Inc. laser plasma x-ray point source are given.

Citation Download Citation

Stephen M. Lane, Troy W. Barbee Jr., Stanley Mrowka, and Juan R. Maldonado "Review of x-ray collimators for x-ray proximity lithography", Proc. SPIE 3767, EUV, X-Ray, and Neutron Optics and Sources, (23 November 1999); https://doi.org/10.1117/12.371115

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