Compact column design for a focused ion-beam lithography system

Qing Ji; Tsu-Jae King; Yvette Y. Lee; Ka-Ngo Leung

doi:10.1117/12.370128

15 November 1999 Compact column design for a focused ion-beam lithography system

Qing Ji, Tsu-Jae King, Yvette Y. Lee, Ka-Ngo Leung

Proceedings Volume 3777, Charged Particle Optics IV; (1999) https://doi.org/10.1117/12.370128
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

A focused ion beam system using a multicusp plasma ion source and an all-electrostatic accelerator column design is being investigated for maskless direct-write lithography processes. The all-electrostatic accelerator column is very compact with a total length of 3 cm. It consists of an extraction lens, a collimator aperture, a focusing lens and a deflector. Ion beam transport code IGUN and charged particle optics design software (Munro's code) are used to analyze and optimize the performance of the accelerator column. The column can accelerate an 0.1 (mu) A O₂⁺ ion beam to about 1 keV and focus it down to 0.2 micrometer spot size. Both axial and deflection aberration of the beam are investigated using the OPTICS and SOFEM packages of Munro's code.

Citation Download Citation

Qing Ji, Tsu-Jae King, Yvette Y. Lee, and Ka-Ngo Leung "Compact column design for a focused ion-beam lithography system", Proc. SPIE 3777, Charged Particle Optics IV, (15 November 1999); https://doi.org/10.1117/12.370128

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