Silicon nitride membranes for filtration and separation

Paul Galambos; Kevin Zavadil; Randy J. Shul; Christi Lober Willison; Samuel L. Miller

doi:10.1117/12.359346

19 August 1999 Silicon nitride membranes for filtration and separation

Paul Galambos, Kevin Zavadil, Randy J. Shul, Christi Lober Willison, Samuel L. Miller

Author Affiliations +

Proceedings Volume 3877, Microfluidic Devices and Systems II; (1999) https://doi.org/10.1117/12.359346
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States

Abstract

Semi-Permeable silicon nitride membranes have been developed using a Bosch etch process followed by a reactive ion etch process. These membranes were observed to allow air but not water to pass through them into surface micromachined, silicon nitride microfluidic channels. Membranes with this property have potential use in microfluidic systems as gas bubble traps and vents, filters to remove particles and gas partitioning membranes. Membrane permeation was measured as 1.6 X 10^-8 mol/m²Pa s of helium for inline membranes at the entrance and exit of the silicon nitride microfluidic channels.

Citation Download Citation

Paul Galambos, Kevin Zavadil, Randy J. Shul, Christi Lober Willison, and Samuel L. Miller "Silicon nitride membranes for filtration and separation", Proc. SPIE 3877, Microfluidic Devices and Systems II, (19 August 1999); https://doi.org/10.1117/12.359346

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