New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule

Etsuko Iguchi; Hiroshi Komano; Toshimasa Nakayama

doi:10.1117/12.388337

23 June 2000 New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule

Etsuko Iguchi, Hiroshi Komano, Toshimasa Nakayama

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388337
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The major challenge for a new thin bottom anti-reflection coating (BARC) materials is how efficiently the light reflection can be reduced from the substrate. This becomes complex when the substrate involves transparent inter-layers such as the damascene process. The optimum refractive index (n) and extinction coefficient (k) for a new BARC were simulated with a commercially available software. We have successfully developed a new BARC, SWK-EX6, with other requirements such as high etch selectivity and gap filling capability considered. Lithographic performances were evaluated with a KrF exposure tool (NA 0.60, 2/3 annular illumination) for 150 nm line and space patterns.

Citation Download Citation

Etsuko Iguchi, Hiroshi Komano, and Toshimasa Nakayama "New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388337

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