Al2O3 coatings for 193 nm: a nonlinearly absorbing material

Oliver Apel; Klaus R. Mann

doi:10.1117/12.388975

5 July 2000 Al₂O₃ coatings for 193 nm: a nonlinearly absorbing material

Oliver Apel, Klaus R. Mann

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388975
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

New absorption measurements for aluminum oxide optical coatings at 193nm are presented. Apart from the strong linear absorption at this wavelength the data indicate a nonlinear absorption within the thin dielectric layer which increases nonlinearly with the layer thickness. By varying the layer thickness, the intrinsic contribution of the layer material to the overall absorption was separated from the contribution of the substrate and the interface. In addition, the conditioning behavior of the coatings was examined. A strong long term conditioning in the linear absorption was found for Al₂O₃ containing systems. Comparing the absorption and conditioning behavior of the single layers and a high-reflective system, we can show that the absorption properties of the HR-system are determined by its Al₂O₃ layers.

Citation Download Citation

Oliver Apel and Klaus R. Mann "Al₂O₃ coatings for 193 nm: a nonlinearly absorbing material", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388975

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available