Understanding lens aberration and influences to lithographic imaging

Bruce W. Smith; Ralph E. Schlief

doi:10.1117/12.389018

5 July 2000 Understanding lens aberration and influences to lithographic imaging

Bruce W. Smith, Ralph E. Schlief

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389018
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Lithographic imaging in the presence of lens aberration result sin unique effects, depending on feature type, size, phase, illumination, and pupil use. As higher demands are placed on optical lithography tools, a better understanding of the influence of lens aberration is required. The goal of this paper is to develop some fundamental relationships and to address issues regarding the importance, influence, and interdependence of imaging parameters and aberration.

Citation Download Citation

Bruce W. Smith and Ralph E. Schlief "Understanding lens aberration and influences to lithographic imaging", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389018

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