Newly developed mask inspection system with DUV laser illumination

Katsuki Oohashi; Hiromu Inoue; Takehiko Nomura; Akira Ono; Mitsuo Tabata; Hitoshi Suzuki

doi:10.1117/12.392086

19 July 2000 Newly developed mask inspection system with DUV laser illumination

Katsuki Oohashi, Hiromu Inoue, Takehiko Nomura, Akira Ono, Mitsuo Tabata, Hitoshi Suzuki

Author Affiliations +

Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392086
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan

Abstract

A new mask inspection system for 150nm and 130nm semiconductor devices which utilizes a DUV laser of 257nm wavelength for an inspection illumination has been developed. A newly developed optical phase shift disk cancels the speckle nose caused by the high coherency of a laser. The phase shift disk has micro pits with different depth disposed randomly over the entire plate surface. The speckle pattern changes randomly by rotating the plate, and averaging pattern image by TDI sensor cancels the speckle noise of the laser illumination. Using this method, inspection of masks was realized at DUV wavelength.

Citation Download Citation

Katsuki Oohashi, Hiromu Inoue, Takehiko Nomura, Akira Ono, Mitsuo Tabata, and Hitoshi Suzuki "Newly developed mask inspection system with DUV laser illumination", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392086

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