Investigation on total scattering at 157 nm and 193 nm

Puja Kadkhoda; Herbert Welling; Stefan Guenster; Detlev Ristau

doi:10.1117/12.405837

2 November 2000 Investigation on total scattering at 157 nm and 193 nm

Puja Kadkhoda, Herbert Welling, Stefan Guenster, Detlev Ristau

Author Affiliations +

Proceedings Volume 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries; (2000) https://doi.org/10.1117/12.405837
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Optical scattering is a fundamental loss mechanism in high power laser applications, especially for optical systems in the DUV/VUV spectral range. For recording of total optical scattering (TS) several standardized measurement procedures which are optimized for the UV/VIS/NIR spectral range, are already existing. In this study, the problems of total scatter measurement techniques in the DUV/VUV will be discussed in respect to their practicability. In addition improvements for the standardized measurement procedures will be presented. TS measurements on selected coated laser components for 157nm and 193nm will be discussed in view of the loss mechanisms in thermally evaporated dielectric multilayer coating systems. The change or rms surface roughness of the components in dependence of the physical thickness of coated thin films will be described with the help of TS measurements. Also, the TS results for bare substrates in VUV and VIS will be compared and considered in relation to applications in short wavelength ranges.

Citation Download Citation

Puja Kadkhoda, Herbert Welling, Stefan Guenster, and Detlev Ristau "Investigation on total scattering at 157 nm and 193 nm", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405837

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