Neolithography Consortium: a progress report

James E. Potzick

doi:10.1117/12.410747

22 January 2001 Neolithography Consortium: a progress report

James E. Potzick

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410747
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear due to diffraction and other effects.

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James E. Potzick "Neolithography Consortium: a progress report", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410747

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