New novel method for solving ASML alignment fail (model error) in color filter process

Fu-Tien Weng; Chung-Sheng Hsiung; Yu-Kung Hsiao; Sheng-Liang Pang; Kuo-Liang Lu

doi:10.1117/12.425276

23 April 2001 New novel method for solving ASML alignment fail (model error) in color filter process

Fu-Tien Weng, Chung-Sheng Hsiung, Yu-Kung Hsiao, Sheng-Liang Pang, Kuo-Liang Lu

Proceedings Volume 4406, In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II; (2001) https://doi.org/10.1117/12.425276
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

For better resolution and throughput concern on color filter process, we use ASML5500/100 for color filter production instead of 1X CANON, but it often suffered alignment fail (error code: model error) at the green layer. Some items have been studied: (1) pattern close to ASML PM mark; (2) level sensor issue (level sensor contamination, plate tilt, level lens contamination); (3) different process sequence; (4) open the clear-out window at passivation layer to reduce interference effect. All of these items are proved no obviously influence to induce model error. By checking the spectrum of the green photo-resist, we found that it is low transmittance at 633 nm¹ (the wavelength that the ASML alignment laser uses). Raising the transmittance by reducing the thickness of green resist is proved useful to eliminate the occurrence of model error. On the other hand, the ATHENA^TM provided by ASML which use red and green lights for alignment will get rid of the alignment failure.

Citation Download Citation

Fu-Tien Weng, Chung-Sheng Hsiung, Yu-Kung Hsiao, Sheng-Liang Pang, and Kuo-Liang Lu "New novel method for solving ASML alignment fail (model error) in color filter process", Proc. SPIE 4406, In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing II, (23 April 2001); https://doi.org/10.1117/12.425276

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