Laser - Assisted Chemical Etching

F A Houle

doi:10.1117/12.939444

14 June 1984 Laser - Assisted Chemical Etching

F A Houle

Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939444
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States

Abstract

Laser-induced or -enhanced chemical etching of solid surfaces has provided an important new tool in recent years for materials processing. Studies have been reported on a wide range of substrates, including semiconductors, metals, ceramics, glasses and thin organic films. In this paper the current status of the field is reviewed. Characteristics of laser etching of various materials are described. Activities related to applications and to fundamental understanding of the process are also discussed.

Citation Download Citation

F A Houle "Laser - Assisted Chemical Etching", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939444

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