Paper
29 October 2001 Fabrication of submicron-sized structures on hybrid sol-gel glass with electron-beam lithography
HongJin Jiang, XiaoCong Yuan, Wai Chye Cheong
Author Affiliations +
Proceedings Volume 4594, Design, Fabrication, and Characterization of Photonic Devices II; (2001) https://doi.org/10.1117/12.446535
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore
Abstract
An electron-beam sensitive inorganic-organic hybrid SiO2TiO2 glass was synthesized for the fabrication of structures with sub-micron sized features. The sensitivity of the sol-gel material was characterized with the electron beam dosage and the optimized doses were found to cross-link the material for sub-micron structures. Due to its properties of low thermal expansion, good mechanical strength and chemical durability, the sol-gel material can be used as resistance in the dry etching process in optoelectronics fabrications. For micro-optical elements, the diffractive optical elements can be fabricated directly into the sol-gel glass without etching.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
HongJin Jiang, XiaoCong Yuan, and Wai Chye Cheong "Fabrication of submicron-sized structures on hybrid sol-gel glass with electron-beam lithography", Proc. SPIE 4594, Design, Fabrication, and Characterization of Photonic Devices II, (29 October 2001); https://doi.org/10.1117/12.446535
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KEYWORDS
Sol-gels

Glasses

Refractive index

Lithography

Optical components

Etching

Titanium

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