Paper
29 October 2001 Polishing micro-optic components for use in photonic systems
Irene M. Peterson
Author Affiliations +
Proceedings Volume 4595, Photonic Systems and Applications; (2001) https://doi.org/10.1117/12.446635
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore
Abstract
A fundamental understanding of the mechanisms and variables involved in mechanical and chemical material removal can reduce the trail and error involved in designing a polishing schedule. This paper summarizes some key results from the literature on the relationship between damage mechanisms, removal rates, materials properties and polishing machine variables. A case history on development of a schedule for fiber polishing illustrates some practical examples of the challenges encountered, and also discusses the effects of different abrasive materials.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irene M. Peterson "Polishing micro-optic components for use in photonic systems", Proc. SPIE 4595, Photonic Systems and Applications, (29 October 2001); https://doi.org/10.1117/12.446635
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KEYWORDS
Polishing

Abrasives

Surface finishing

Glasses

Particles

Diamond

Oxides

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