Imaging interferometric microscopy for enhanced resolution

Christian J. Schwarz; Yuliya Kuznetsova; Steven R. J. Brueck

doi:10.1117/12.473526

16 July 2002 Imaging interferometric microscopy for enhanced resolution

Christian J. Schwarz, Yuliya Kuznetsova, Steven R. J. Brueck

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Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473526
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Using the principle of imaging interferometry we resolve structures with a relatively low NA microscope objection which could not be resolved in the conventional illumination setup. We show experimental results for the cases of 700- and 4000-nm period gratings. We compare these results with theoretical simulations and estimate the maximum resolution potential. Also we evaluate further advantages of our approach, such as field of view and working distance.

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Christian J. Schwarz, Yuliya Kuznetsova, and Steven R. J. Brueck "Imaging interferometric microscopy for enhanced resolution", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473526

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