Optimization of Eth method for DUV process inline monitor

Wenzhan Zhou; Hao Chen; Teng Hwee Ng; Hui Kow Lim

doi:10.1117/12.473442

16 July 2002 Optimization of E_th method for DUV process inline monitor

Wenzhan Zhou, Hao Chen, Teng Hwee Ng, Hui Kow Lim

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473442
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

In this paper, we describe the optimization strategy for Eth (Dose to clear) method of DUV resist process control for 0.25um technology. Both experimental and simulation results will be presented to show the optical and developing behaviors of DUV resist in extreme low energy exposure condition. Based on these data we proposed an optimized method of Eth measurement. With this method, false alarm of DUV resist photo-speed and exposure out of control will be eliminated, cost of manpower for OOC troubleshooting will be saved.

Citation Download Citation

Wenzhan Zhou, Hao Chen, Teng Hwee Ng, and Hui Kow Lim "Optimization of E_th method for DUV process inline monitor", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473442

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