Tip characterization for CD-AFM: getting to 2 nm, 3 sigma

Kirk Miller; Ami Chand; Greg Dahlen; Bradley Todd

doi:10.1117/12.473412

16 July 2002 Tip characterization for CD-AFM: getting to 2 nm, 3 sigma

Kirk Miller, Ami Chand, Greg Dahlen, Bradley Todd

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473412
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We present nanometer-scale physical structures and analysis algorithms for characterizing tip width and shape for critical dimension atomic force microscopy (CD-AFM). Automated CD-AFM measurements will be used in future generation, and a robust methodology is demonstrated for ensuring long-term repeatability of width measurements on sub-100 nm structures. Structures are designed and chosen for their width uniformity on the sub-nm scale, as well as for their well defined shapes that can be deconvolved from the scan data to yield a precise image of the tip. We apply our tip characterization techniques to measurements of photoresist linewidth, contact etch and poly Si gate width in a manufacturing environment, and show that tool performance and characterization strategy can combine to give excellent long-term repeatability.

Citation Download Citation

Kirk Miller, Ami Chand, Greg Dahlen, and Bradley Todd "Tip characterization for CD-AFM: getting to 2 nm, 3 sigma", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473412

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