Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Jeff Meute; Georgia K. Rich; Stefan Hien; Kim R. Dean; Carolyn Gondran; Julian S. Cashmore; Dominic Ashworth; James E. Webb; Lisa R. Rich; Paul G. Dewa

doi:10.1117/12.474621

30 July 2002 Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Jeff Meute, Georgia K. Rich, Stefan Hien, Kim R. Dean, Carolyn Gondran, Julian S. Cashmore, Dominic Ashworth, James E. Webb, Lisa R. Rich, Paul G. Dewa

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474621
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Significant improvement in 157nm optical components lifetime is required for successful implementation of pilot and production scale 157nm lithography. To date, most of the 157nm optics lifetime data has been collected in controlled laboratory conditions by introducing predetermined concentrations of contaminants and monitoring degradation in terms of transmission loss. This publication compliments prior work by documenting field experience with the 157nm Exitech Microstepper currently in operation at International SEMATECH. Failure mechanisms of various optical components are presented and molecular contamination levels in purge gas, tool enclosure, and clean room are documented. Finally the impacts of contaminant deposition and degradation of components on imaging performance is discussed.

Citation Download Citation

Jeff Meute, Georgia K. Rich, Stefan Hien, Kim R. Dean, Carolyn Gondran, Julian S. Cashmore, Dominic Ashworth, James E. Webb, Lisa R. Rich, and Paul G. Dewa "Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474621

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