Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements

Juergen Ihlemann; Dirk Schaefer

doi:10.1117/12.472928

17 January 2003 Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements

Juergen Ihlemann, Dirk Schaefer

Author Affiliations +

Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.472928
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

Excimer laser ablation is a versatile method to generate three dimensional microstructured devices for mechanics, fluidics and optics. Especially, if in one dimension the structure is predefined by a layer design, and the other two dimensions are defined in the layer ablation process by mask projection, very precise structure definition in three dimensions and ablated surfaces with optical quality can be achieved. Patterning optical layers or layer stacks, a variety of applications is possible. As examples the fabrication of dielectric masks and diffractive optical elements and the performance of these elements in shaping excimer laser beams are demonstrated.

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Juergen Ihlemann and Dirk Schaefer "Laser ablation patterning of layered systems: a method to fabricate dielectric masks and diffractive phase elements", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.472928

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