Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method

Christof G. Krautschik; Iwao Nishiyama

doi:10.1117/12.482640

16 June 2003 Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482640
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The defect printability for two types of patterns isolated lines and contact holes was studied through a finite-difference time-domain (FDTD) computer simulation approach at the EUV wavelength of 13.5 nm. A three-dimensional FDTD solver was employed for aerial image analysis to assess the overall acceptable defect size for both opaque as well as clear phase defects for the 32 nm technology node.

Citation Download Citation

Christof G. Krautschik and Iwao Nishiyama "Printability of opaque and clear phase defects using the finite-difference time-domain (FDTD) method", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482640

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