Strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma

Tatsuya Aota; Hidehiko Yashiro; Yoshifumi Ueno; Toshihisa Tomie

doi:10.1117/12.482631

16 June 2003 Strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma

Tatsuya Aota, Hidehiko Yashiro, Yoshifumi Ueno, Toshihisa Tomie

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482631
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We succeeded in generating a strong narrowband peak at 13.7 nm in a cavity confined Sn plasma. Fraction of the energy within 2% bandwidth at 13.7 nm against the total radiation spectrum was 11.3%. In our experiment, the plasma is generated not on a solid plate but in a cavity as described below. A YAG laser pulse ablates the surface of a concave structure Sn target in order to supply the material for plasma generation. The next laser pulse with 1064nm wavelength heats the ablated material to generate a high temperature plasma. The ablation YAG laser is focused to 600μm diameter with a flux of 10 J/cm². The heating YAG laser is focused to 100μm diameter at a delay time of 30 ns after the laser ablation. Emission spectra are observed using a grazing incidence Hitachi flat-field grating and a back side illuminated CCD detector. Fraction of the energy at 13.7nm within 2% bandwidth in the whole radiation energy was 11.3%. However, the intensity of the spectrum peak was about 1/10 against the plane Sn target LPP source. When nano (less than 200 nm diameter) particle SnO₂ deposited on a 100nm-thick Si3N4 membrane were irradiated, a sharp peak was observed. The intensity of the spectral peak of the nano particle SnO₂ target LPP source was as high as that of the plane Sn target LPP source. The EUV energy within 2% bandwidth at around 13.7 nm to the whole radiation energy of the nano particle SnO₂ target LPP source was 7.4%.

Citation Download Citation

Tatsuya Aota, Hidehiko Yashiro, Yoshifumi Ueno, and Toshihisa Tomie "Strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482631

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