Paper
2 June 2003 Copy result exactly using the EB-SCOPE technology
Keizo Yamada, Takeo Ushiki, Yousuke Itagaki, Robert Newcomb
Author Affiliations +
Abstract
This paper presents the concept of 'copy result exactly' frameworks using EB-SCOPE technology which must be a powerful tool for coping the best process condition producing ever lasting good contact and via hole.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keizo Yamada, Takeo Ushiki, Yousuke Itagaki, and Robert Newcomb "Copy result exactly using the EB-SCOPE technology", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.485028
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KEYWORDS
Semiconducting wafers

Process control

Silica

Silicon

Electron beams

Etching

Yield improvement

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