Method for rapid screening of photoresist strippers for acceptance in DUV lithographic areas

John C. Moore; Shankar C. Acharya

doi:10.1117/12.488118

2 June 2003 Method for rapid screening of photoresist strippers for acceptance in DUV lithographic areas

John C. Moore, Shankar C. Acharya

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.488118
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Airborne contaminants have been shown to cause image degradation to acid-catalyzed chemcially amplified resists at low concentrations. In addition to mitigation measures, choices can be made to remove resist strippers from the DUV fab and eliminate those known to poison the resist. Such choices can be made based on the evaporative alkalinity of the stripper. A method has been developed as a rapid technique for testing the ariborne alkalinity strength of various resist strippers. This screening technique provides rapid information at minimal cost to qualify safe chemical strippers for the DUV fab. Experimental results on resist strippers to include commoditites such as isopropanol, a cyclic ketone, amide, and specialty blends that contain amines as well as a high performance product, GenSolve.

Citation Download Citation

John C. Moore and Shankar C. Acharya "Method for rapid screening of photoresist strippers for acceptance in DUV lithographic areas", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.488118

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