System test for high-NA objectives at the 157-nm wavelength

Horst Schreiber

doi:10.1117/12.513480

26 February 2004 System test for high-NA objectives at the 157-nm wavelength

Horst Schreiber

Author Affiliations +

Proceedings Volume 5252, Optical Fabrication, Testing, and Metrology; (2004) https://doi.org/10.1117/12.513480
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

Focusing on small features for optical inspection or defect repair, shorter wavelengths are used to increase resolution and energy density. Objectives designed for 157 nm using calcium fluoride are optimized and evaluated interferometrically at the wavelength of use to include all actinic effects. An image evaluation set-up is presented using a custom illuminator to image 130nm features, enlarged 500 times, onto a back-thinned CCD camera in real time.

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Horst Schreiber "System test for high-NA objectives at the 157-nm wavelength", Proc. SPIE 5252, Optical Fabrication, Testing, and Metrology, (26 February 2004); https://doi.org/10.1117/12.513480

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