Optimization design and fabrication of photonic crystal waveguides based on SOI using 248-nm deep-UV lithography

Lingyun Xie; Yejin Zhang; Xiaozhou Peng; Shizhong Xie

doi:10.1117/12.520153

12 May 2004 Optimization design and fabrication of photonic crystal waveguides based on SOI using 248-nm deep-UV lithography

Lingyun Xie, Yejin Zhang, Xiaozhou Peng, Shizhong Xie

Author Affiliations +

Proceedings Volume 5280, Materials, Active Devices, and Optical Amplifiers; (2004) https://doi.org/10.1117/12.520153
Event: Asia-Pacific Optical and Wireless Communications, 2003, Wuhan, China

Abstract

In this work, methods of design and fabrication of photonic bandgap structures (PBG) and photonic crystal waveguides based on SOI (silicon on insulator) are presented. In theory, a method that incorporates the plane wave expansion (PWE) method based on supercell with the finite-difference time-domain (FDTD) method with a perfectly matched layer (PML) boundary condition has been investigated. At first, PWE simulation will present a band structure. Then according to the band structure, FDTD tool can simulate a light propagation and can obtain optimized parameters easily. With the method, several photonic crystal devices suitable for 248nm Deep UV lithography and 0.18um ion-beam etching are designed and fabricated.

Citation Download Citation

Lingyun Xie, Yejin Zhang, Xiaozhou Peng, and Shizhong Xie "Optimization design and fabrication of photonic crystal waveguides based on SOI using 248-nm deep-UV lithography", Proc. SPIE 5280, Materials, Active Devices, and Optical Amplifiers, (12 May 2004); https://doi.org/10.1117/12.520153

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