Paper
14 May 2004 A study on the dissolution inhibition of poly norbornene hexafluoroisopropanol in aqueous base solutions
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Abstract
It is confirmed that strong inhibitors must not only interact with the polymer but also are highly hydrophobic. A proportional relationship was shown between the inhibition and log P of different additives. In general, PAGs also follow this relationship, however triphenylsulfonium PAGs appear to be less effective inhibitors than bis-t-butylphenyliodonium PAGs having the same anions.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Medhat A. Toukhy, Joseph Oberlander, Dalil Rahman, and Francis M. Houlihan "A study on the dissolution inhibition of poly norbornene hexafluoroisopropanol in aqueous base solutions", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.537077
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KEYWORDS
Polymers

Hydrogen

Molecules

Lithography

193nm lithography

Molybdenum

Absorption

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