Automated fault detection and classification of etch systems using modular neural networks

Sang Jeen Hong; Gary Stephen May; John Yamartino; Andrew Skumanich

doi:10.1117/12.536870

29 April 2004 Automated fault detection and classification of etch systems using modular neural networks

Sang Jeen Hong, Gary Stephen May, John Yamartino, Andrew Skumanich

Proceedings Volume 5378, Data Analysis and Modeling for Process Control; (2004) https://doi.org/10.1117/12.536870
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Modular neural networks (MNNs) are investigated as a tool for modeling process behavior and fault detection and classification (FDC) using tool data in plasma etching. Principal component analysis (PCA) is initially employed to reduce the dimensionality of the voluminous multivariate tool data and to establish relationships between the acquired data and the process state. MNNs are subsequently used to identify anomalous process behavior. A gradient-based fuzzy C-means clustering algorithm is implemented to enhance MNN performance. MNNs for eleven individual steps of etch runs are trained with data acquired from baseline, control (acceptable), and perturbed (unacceptable) runs, and then tested with data not used for training. In the fault identification phase, a 0% of false alarm rate for the control runs is achieved.

Citation Download Citation

Sang Jeen Hong, Gary Stephen May, John Yamartino, and Andrew Skumanich "Automated fault detection and classification of etch systems using modular neural networks", Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); https://doi.org/10.1117/12.536870

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