The guideline of reticle data management

Norihiko Miyazaki; N. Iriki; M. Homma; T. Sato; M. Mori; Tadashi Imoriya; Toshio Onodera; T. Matsuda; Hidehiro Higashino; K. Okuda; Iwao Higashikawa; Nobuyuki Yoshioka

doi:10.1117/12.557741

20 August 2004 The guideline of reticle data management

Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557741
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

We reported the Guideline(Ver. 1) of Reticle Data Management(RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Especially, these subjects have been the lithography Cost including Reticle Cost, shorter life cycle of product, more difficult technique, lower cost and shorter total TAT from design to chip shipping. Guideline Ver 1.0 announced the standardization of interface contents over Design to Mask manufacture, and to wafer manufacture. Guideline Ver 2.0 will announce this RDM activity has been developed the optimization of a new engineering chain management in addition to the pattern data and the linkage to EDA in 2003.

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Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, and Nobuyuki Yoshioka "The guideline of reticle data management", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557741

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