A complementary lithographic simulation method for improved yields following full-chip DRC

Peter Nikolsky; Rama Tweg; Mike Pochkowski

doi:10.1117/12.593125

6 December 2004 A complementary lithographic simulation method for improved yields following full-chip DRC

Peter Nikolsky, Rama Tweg, Mike Pochkowski

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.593125
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

In this paper the impact of photolithography simulations on the workflow for accomplishing Full Chip DRC verification was investigated. The potential for simulation to reliably replace trial and error was determined. Initially simulations were done for a poly-Si layer, using KLA’s PROLITH v8 tool, to predict printability of Full Chip DRC. The simulation results were then compared to actual printed features. Photo resist parameter calibration was determined to have significant impact on the accuracy of printed feature predictions. The benefits of using simulations in the DRC verification workflow was determined in terms of cycle time and mask set cost reductions.

Citation Download Citation

Peter Nikolsky, Rama Tweg, and Mike Pochkowski "A complementary lithographic simulation method for improved yields following full-chip DRC", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.593125

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE