Paper
6 December 2004 Flexible MRC rules for OPC
Author Affiliations +
Abstract
Optical Proximity Correction (OPC) can be formulated as a constrained optimization problem. The constraints are mask constraint rules for space and width. These are sometimes called Mask Rule Checks (MRC), or Design Rule Checks (DRC). At 90nm and below, intelligent constraint handling is required for good OPC. In this paper, we show a technique for OPC constraint checking which is built in to the OPC feedback algorithm. The system is flexible enough to allow relaxed rules for corner-to-corner checking versus edge-to-edge checking. Also, the system can categorize checks by the length of the edges being compared. Lastly, the system can create special checks from line-ends to other features, or any user-defined edge type to any other user-defined edge type. In addition, we present a method for multiple layer enclosure rules which can be used for multiple exposure OPC. These enclosure constraints are useful for assurance of overlay tolerance.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicolas B. Cobb, Eugene Miloslavsky, and George Lippincott "Flexible MRC rules for OPC", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.568420
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical proximity correction

Feedback loops

Computer simulations

Multilayers

SRAF

Tolerancing

Manufacturing

RELATED CONTENT


Back to Top