A plasma etching perspective of patterning novel materials and small structures

Jane P. Chang

doi:10.1117/12.571790

19 January 2005 A plasma etching perspective of patterning novel materials and small structures

Jane P. Chang

Proceedings Volume 5592, Nanofabrication: Technologies, Devices, and Applications; (2005) https://doi.org/10.1117/12.571790
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States

Abstract

Plasma etching is an enabling technology to pattern novel materials and to generate small structures. This paper provides a plasma etching perspective in the era of nanofabrication, using the definition of the gate structure of a metal-oxide-semiconductor field effect transistor (MOSFET) as an example, followed by the importance of predictive modeling, and finally the application challenges of plasma etching in fabricating micro-chemical and biological sensors.

Citation Download Citation

Jane P. Chang "A plasma etching perspective of patterning novel materials and small structures", Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); https://doi.org/10.1117/12.571790

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